摘要
采用直流磁控溅射技术制备了CrNx涂层,研究了工艺参数对所制备的CrNx涂层膜基结合力的影响.实验结果表明:N2含量较低时,膜基结合力较好,涂层表面光滑.只加脉冲偏压时,偏压越大,熔滴越大,表面越粗糙.
The CrNx coatings are prepared by DC magnetron sputtering. This paper studies the effects of process parameters on the film-substrate adhesion of CrNx coatings. The results show that better film-sub- strate adhesion and smooth surface of coatings can be obtained at lower N2 content. If only pulse bias volt- age is applied,the higher the bias voltage,the larger the droplet,and the more rough the surface.
出处
《成都大学学报（自然科学版）》
2014年第1期61-63,共3页
Journal of Chengdu University（Natural Science Edition）
关键词
膜基结合力
CrNx涂层
工艺参数
磁控溅射
film-substmte adhesion
CrlXI~ coatings
process parameters
DC magnetron sputtering
