摘要
对低温加热工艺生产的以AlN为主抑制剂的高磁感取向硅钢高温退火过程进行中断实验，借助电子背散射衍射技术对高温退火过程中高斯晶粒的演变进行了研究.在升温过程中高斯晶粒平均尺寸先减小再增大.800℃时取向分布函数图出现高斯织构组分，但强度很弱，高斯晶粒偏离角在10o以上；900℃时高斯晶粒平均生长速率超过其他晶粒；950~1000℃时高斯晶粒异常长大，偏离角3o~6o；在1000℃之前高斯取向晶粒相比于其他晶粒没有尺寸优势.
The high-temperature annealing process of high permeability grain-oriented silicon steel with AlN as an inhibitor was studied by interrupting test. The evolution of Goss texture in this process was analyzed by electron back-scattered diffraction. It is found that the Goss grain size first decreases and then increases with the rise of temperature. Goss texture appears in the orientation distribu-tion function at 800℃, but the intensity is very weak and the deviation angle is more than 10o. The average growth rate of Goss grains is faster than other grains at 900℃. Goss grains grow abnormally from 950 to 1000℃, and the deviation angle ranges from 3o to 6o. Before 1000℃, in comparison with other grains, Goss grains have no size advantage.
出处
《北京科技大学学报》
EI
CAS
CSCD
北大核心
2014年第3期328-332,共5页
Journal of University of Science and Technology Beijing
基金
国家自然科学基金和宝山钢铁股份有限公司联合资助项目(50934009)
关键词
硅钢
高斯织构
退火
再结晶
晶粒尺寸
silicon steel
Goss texture
annealing
recrystallization
grain size
