等离子体增强原子层沉积系统及其应用研究

Lab-Built Plasma Enhanced Atomic Layer Deposition Reactor and Its Applications

介绍了自行设计的等离子体增强原子层沉积(PEALD)系统及其原位制备氮掺杂纳米TiO2可见光催化剂的实验结果。PEALD系统主要由远程脉冲感应耦合等离子体发生器、真空反应腔室、真空系统、前驱体输运系统、控制系统等部分组成。沉积过程中前驱体的交替、等离子体的产生、样品台温度、载气流量、沉积周期等参数都可以预先设定并由控制系统自动执行。在研制的PEALD系统上首次开展原位氮掺杂纳米TiO2光催化剂的制备,高分辨透射电镜结果表明制备的氮掺杂TiO2薄膜为非晶态结构,薄膜厚度为3 nm,生长速率为0.05 nm/cycle;X射线光电子能谱结果表明N元素掺入到了制备的TiO2薄膜,并取代了TiO2薄膜中的O元素;紫外-可见光谱表明制备的氮掺杂TiO2薄膜对可见光的吸收率明显增强。

A novel type of plasma enhanced atomic layer deposition reactor was designed, constructed, and tested in the synthesis of N-doped Ti02 photo-catalyst. The reactor consists of a vacuum system, a remote pulsed inductively coupled plasma generator,precursor transport path, and the automatic control unit, capable of regulating the film growth conditions,such as the plasma generation, substrate temperature, gas flow rate, deposition cycle, and etc. The N-doped Ti02 films deposited in the test were characterized with X-ray diffraction, X-ray photoelectron spectroscopy, high resolution transmission electron microscopy, and ultraviolet visible spectroscopy. The results show that the 3 nm thick amorphous Ndoped Ti02 were synthesized at a growth rate of 0.05 nm/ cycle; and that some N substituted ° in the Ti02 film. We found that the N-doping significantly increases the absorption efficiency in the visible light range.