离子辐照单晶Si损伤效应的研究

Radiation Damage in Silicon Induced by Ion Irradiation

回顾了低能离子注入单晶 Si经由核弹性碰撞引起的损伤特征及其常规的研究方法 ,介绍了快重离子辐照单晶 Si经由电子能损引起的损伤特点及研究现状 。

The radiation damage in silicon induced by low energy ion implantation was briefly reviewed together with a short introduction to the common techniques in the area. The damage characteristics of swift heavy ion irradiation in silicon and its investigations were introduced with emphasis on the effects induced by processes of electronic energy losses. It is shown that swift heavy ion can induce defects far beyond the projected range and up to 28 MeV/μm the electronic energy loss has little but not omissible effects on the defect production. The perspectives with the investigations were discussed.