磁控溅射金基合金靶材的制备、应用及发展趋势

Manufacture,Application and Trends of Gold-base Sputtering Target Alloys

磁控溅射金基合金镀膜材料以其特有的性能和特点,应用范围越来越广。作为源材料,金基合金靶材的质量对溅射工艺及镀膜性能起着至关重要的作用。主要介绍常用金基合金的种类;金基合金溅射靶材的制备方法及应用现状;高端金基合金溅射靶材制备的技术要求、存在的问题及未来的发展思路。

For the reason of outstanding performance and unique character, gold-base coating materials pro- duced by magnetron sputtering were used widely and widely. As the source bulk material for coatings, the quality of gold-base target alloys has great effects on sputtering technique and properties of coatings. Some conventional type of gold-base alloys, making technology of gold-based sputtering target material as well as the status of their development and application, and the technical requirement of making advanced gold-base sputtering target materials are reviewed. Furthermore, the existing problems and developing trends in the future are also discussed.