期刊文献+

4Cr13不锈钢表面镀TiN薄膜组织结构及性能的研究 被引量:3

Investigation on Microstructure and Property of TiN Film Deposited on the Surface of 4Cr13 Stainless Steel
下载PDF
导出
摘要 采用多弧离子镀技术在4Cr13不锈钢上沉积TiN薄膜,在其他参数不变的条件下,研究不同弧电流下薄膜的组织、结构及性能。利用扫描电子显微镜、X射线衍射仪、显微硬度计、划痕仪和往复式摩擦磨损仪分别对薄膜进行表面形貌观察,物相分析,以及表面硬度、结合力、耐磨性检测。实验结果表明:弧电流对薄膜的表面形貌有明显的影响,随着弧电流的增大,薄膜表面的液滴数目和尺寸逐步增大;薄膜的相结构主要由TiN相组成,在(111)面有较强的择优取向,且随着弧电流的增大,衍射峰强度略有增加;随着弧电流的增大,薄膜的硬度先增大后减小,硬度值最大为2897HV;随着弧电流的增大,薄膜的结合力先增大后减小,当弧电流为105A时,薄膜的结合力最大,为75N;随着弧电流的增大,薄膜的摩擦系数先减小后增大,当弧电流为105A时,薄膜的耐磨性最好。 TiN films were deposited on 4Cr13 martensitic stainless steel by multi-arc ion plating (MAIP) when the other parameters were fixed. The effects of currents of target applied to the substrate on the structure micro-hard- ness and adhesion strength of the films were studied. The surface morphologies of TiN films were investigated by SEM, the phase structures were investigated by XRD, the micro-hardness of coatings were investigated by hardness instrument. The results show that the number and size of large particles in the film increased when the currents of tar- get increased; the phase structure mainly composed of TiN phase, the film tend to (111) preferred; the micro-hard- ness of film increased at first then decreased as the currents of target increased, the maximum hardness values was 2897HV; the adhesion strength of the films increased at first then decreased as the currents of target increased, when the currents of target was 105 A,the maximum adhesion strength of the films was 75 N; the coefficient of friction of the film decreased at first then increased, when the currents of target was 105 A, the TiN film shows excellent wear resistance.
出处 《材料导报》 EI CAS CSCD 北大核心 2014年第4期84-87,共4页 Materials Reports
基金 国家自然科学基金(51264007) 国家自然科学基金青年基金(51201043) 广西自然科学基金重点项目(2010GXNSFD013008) 桂林电子科技大学-桂林电器科学研究院研究生联合培养基地专项经费资助(20121225-03-Z 20121225-10-Z)
关键词 弧电流 TIN薄膜 不锈钢 结合力 耐磨性 currents of target, TiN film, stainless steel, adhesion strength, wear resistance
  • 相关文献

参考文献10

  • 1Musil J,Vlcek J.A perspective of magnetron sputtering in surface engineering[J].Surf Coat Techn,1999,112(1-3):162.
  • 2Subramanian B,Ashok K,Jayachandran M.Effect of substrate temperature on the structural properties of magnetron sputtered titanium nitride thin films with brush plated nickel interlayer on mild steel[J].Appl Surf Sci,2008,255 (5):2133.
  • 3Benegra M,Lamas D G,Rapp M,et al.Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering[J].Thin Solid Films,2006,494(1-2):146.
  • 4史新伟,邱万奇,刘正义.电弧离子镀TiN薄膜中的缺陷及其形成原因[J].中国表面工程,2006,19(1):43-46. 被引量:22
  • 5孙伟,宫秀敏,叶卫平,张覃铁,朱小清.三种材料多弧离子镀TiN涂层性能比较[J].电加工与模具,2000(1):31-33. 被引量:3
  • 6姜雪峰,刘清才,王海波.多弧离子镀技术及其应用[J].重庆大学学报(自然科学版),2006,29(10):55-57. 被引量:47
  • 7Boxman R L,Goldsmith S S.The interaction between plasma and macroparticles in a multi-cathode-spot vacuum arc[J].J Appl Phys,1981,52(1):151.
  • 8Mattews A,Lefkow A R.Problems in the physical vapour deposition of titanium nitride[J].Thin Solid Films,1984,126(3-4):283.
  • 9Pang Z,Boumerzoug M,Kruzelecky R V,et al.Low temperature radio frequency sputter deposition of TiN films using optical emission spectroscopy sa process monitor[J].J Vac Sci Techn A,1994,12(1):83.
  • 10孙伟,宫秀敏,叶卫平,张覃铁,朱小清.多弧离子镀TiN涂层结合力的影响因素[J].材料保护,2000,33(8):31-32. 被引量:34

二级参考文献41

共引文献98

同被引文献46

  • 1沈婕,国俊丰,魏伟,高峰,万伟伟,侯伟骜.超音速喷涂Cr_3C_2-25NiCr复合涂层的组织及电化学特性研究[J].热喷涂技术,2009,1(2):48-52. 被引量:7
  • 2肖正伟,曾振欧,赵国鹏,邱国平.304不锈钢上纳米TiO_2涂层的制备与防腐蚀性能研究[J].电镀与涂饰,2007,26(7):35-38. 被引量:13
  • 3Musil J, Vlcek J. A perspective of magnetron sputtering in surface engineering[J]. Surf Coat Technol, 1999,112 (1-3) : 162.
  • 4Wang H, Zhang Sam, Li Y, et al. Bias effect on micro- structure and mechanical properties of magnetron sputtered nanocrystalline titanium carbide thin films[J]. Thin Solid Films, 2008,516(16) :5419.
  • 5Devia D M, Restrepo-Parra E, Arango P J, et al. TiA1N coatings deposited by triode magnetron sputtering varying the bias voltage[J]. Appl Surf Sci,2011,257(14):6181.
  • 6Gangopadhyay S, Acharya R, Chattopadhyay A K, et al. Effect of substrate bias voltage on structural and mechanical properties of pulsed DC magnetron sputtered TiN-MoS~ composite coatings[J]. Vacuum, 2010,84(6) : 843.
  • 7Nam N D, Kim J G, Itwang W S. Effect of bias voltage on the electrochemical properties of TiN coating for polymer electrolyte membrane fuel cell[J]. Thin Solid Films, 2009, 517(17):4772.
  • 8Kelesoglu E, Mitterer C, tirgen M. Corrosion characteris- tics of plain carbon steal coated with TiN and ZrN under high-flux ion bombardment [J]. Surf Coat Technol, 2002, 160(1) :82.
  • 9Mattox D M. Particle bombardment effects on thin film de- position: A review[J]. J Vac Sci Technol, 1989, A17(3) : 1105.
  • 10Logothetidis S, Meletis E I, Stergioudis G, et al. Room temperature oxidation behavior of TiN thin films[J]. ThinSolid Films, 1999,338 (1-2) : 304.

引证文献3

二级引证文献29

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部