不同调制比NbSiN/VN多层膜微观结构、力学和摩擦性能研究

Synthesis and Characterization of Microstructures and Mechanical Properties of NbSiN/VN Multilayer Films

采用多靶共焦射频磁控溅射制备不同调制比的NbSiN/VN多层膜。利用X射线衍射、扫描电镜、能量色散谱、纳米压痕仪及摩擦试验机对薄膜的成分、相结构、力学及摩擦性能进行分析。结果表明,NbSiN/VN多层膜为fcc与hcp混合结构,NbSiN/VN多层膜的显微硬度随VN调制层厚度的增加而逐渐降低,室温条件下,以Al2O3为摩擦副的NbSiN/VN多层膜平均摩擦系数受调制比影响显著,随VN层厚度的增加,多层膜平均摩擦系数先降低后保持稳定。

The NbSiN/VNmulti-layer films were deposited by multi-target, unbalanced reactive magnetron sputtering. The impacts of the growth conditions on the microstructures and mechanical properties were evaluated. The NbSiN/ VN multi-layer films were characterized with X-ray diffraction, scanning electron microscopy, energy dispersive spec- troscopy, and conventional surface probes. The results show that the fcc-and hcp-phase coexisted, and that the modulation ratio considerably affects the phase-structure and mechanical properties of the NbSiN/VN multi-layer films. For instance, grownat a ratio ranging from 5：1 to 5：3（ 1 - 3 nm thick VN layer） ,the fcc-phased NbSiN/VN films with a VN（ 110）preferred growth orientation were observed,and at a ratio ranging from 5：5 to 5：10（5 - 10 nm thick VN layer）,the hcpphased NbSiN/VN films withaNbSiN（ 101 ）preferential growth orientationwere observed. Moreover, as the VN thickness increased, the friction coefficient of the NbSiN/VNfilms against the A1203 surfaces dropped a little and then became a constant;and its micro-hardness also decreased.