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沉积参数对二氧化钛薄膜结构相变的影响 被引量：4

Effects of deposition parameters on structural phase transition of TiO_2 films
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摘要 用磁控溅射的方法在硅衬底上制备了二氧化钛薄膜,并通过改变薄膜沉积过程中氧气含量、溅射时间、工作压强、衬底温度等溅射参数,制备了系列薄膜样品,得到了二氧化钛薄膜两种相结构的最佳生成条件.研究表明:较高的工作压强有利于金红石结构的生成;衬底加热、增加沉积时间有利于生成锐钛矿结构;氧气含量的变化对薄膜的相结构没有明显影响. The TiO2 films were successfully deposited on Si substrates by magnetron sputtering .We obitained the optimum growth condition of rutile and anatase TiO2 films by changing deposition oxygen content ,sputte-ring pressure ,sputtering power ,sputtering time and substrate temperature .The experimental results show that higher sputtering pressure is good for rutile deposition .Heated substrate and more sputtering time are good for anatase deposition .But the effection of oxygen content on phase structure is not obvious .
作者 刘艳 姜坤 吴宝嘉 顾广瑞
机构地区 延边大学理学院物理系
出处 《延边大学学报（自然科学版）》 CAS 2014年第1期34-37,共4页 Journal of Yanbian University（Natural Science Edition）
基金 国家自然科学基金资助项目(11164031 51272224)
关键词 二氧化钛薄膜 金红石 锐钛矿 结构相变 TiO2 films rutile anatase structural phase transition
分类号 O481.1 [理学—固体物理]
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参考文献13

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二级参考文献13

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共引文献16

同被引文献31

引证文献4

二级引证文献15

延边大学学报（自然科学版）
2014年 第1期

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