基体/介质/金属双层薄膜内应力的研究

A study on internal stress of dielectric and metal double-layer thin films

采用PECVD法和磁控溅射法在 40Cr钢基片上分别沉积氮化硅薄膜和NiCr合金膜 ,用钠光平面干涉法测量双层薄膜的内应力 ,并具体分析该双层薄膜的内应力与薄膜厚度及系统之间的关系 .

The silicon nitride dielectric thin film and NiCr alloy thin film were prepared by PECVD and sputtering methods. The internal stress of the double-layer thin films were measured by using laser beam planar interference and the relationship between stress, thickness and the two-layer system were analysed.