大面积CVD金刚石膜的热铁板抛光

Thermo-Chemical Polishing of Large Area CVD Diamond Films

研制成功国内第１台大面积ＣＶＤ金刚石膜热铁板抛光机．它可以在１０^（－Ｐａ）真空条件下，加热到 １１００℃；抛光台可以在０－１０ｒ／ｍｉｎ间实现无级调速，一次完成３片φ１１０ｍｍ的金刚石膜的抛光．金刚石膜在９８０℃，２ｈ抛光的结果表明该装置有良好的抛光效果．金刚石膜在９８０℃抛光不同时间的Ｒａｍａｎ谱表明，金刚石热铁板抛光是金刚石石墨化和Ｃ原子不断扩散的过程．

The first domestic thermo-chemical polishing apparatus is setup. Three φl10 mm in diameter diamond films can be polished simultaneously at 10^(-3)Pa from 750℃ to 100℃, with the polishing rate incre- asing with increasing temperature. The results of polishing at 980℃ showed that polishing of CVD diamond films is very efficient. Thermo-chemical polishing mechanism is based on the transformation of diamond into graphite and the atomic dissolution of carbon into a hot metal.