宏观粒子在等离子体中的纯化模型研究

Purification Model for Macroscopic Particles in Plasma

从宏观粒子和微观粒子的输运现象及等离子体化学入手 ,建立了宏观粒子沉降过程中的纯化模型 .计算了各类粒子的浓度的径向分布、加速度、速度、沉降时间及杂质的去除总量 .结果表明 ,对于纯度为 99%的Si Ge合金颗粒中的杂质总量可去除 97%左右 .

The purification model of macroscopic particles in descending process is established from the transport phenomena of particles and plasma chemicals. The concentration distribution, acceleration, velocity, and descending time of all kinds of particles and the removing amount of the impurities are calculated. Being identical with the experimental effects, the results show that about 97?% of impurities in silicon-germanium alloy powder can be removed.