高压静电场和氮离子复合处理对链霉菌的影响

Compound Processing Effects of HVEF and Low Energy N^+ Ion on Streptomyces Aureofaciens

分析了不同剂量氮离子(N+)和高压静电场(HVEF)处理金色链霉菌的存活率和突变率关系,进而确定了最佳处理参数:N+能量10kev·cm-1,注入剂量1.82×1015N+ions·cm-2、2.86×1015N+ions·cm-2,电场剂量(时间、场强)20s×0.5kv·cm-2、60s×2kv·cm-2。用上述优选的HVEF和N+剂量对金色链霉菌进行复合处理,发现在部分复合处理条件下,菌株正变率比使用等剂量N+单因子处理的正变率要高。通过对出发菌株SL2、N+注入选育的高产菌株M226以及N+和HVEF复合处理获得的高产菌株D1114的3种保护酶POD、SOD、CAT的活性进行检测,发现D1114菌株3种酶的活性均最高,其次是M226,说明这3种酶在诱变处理中扮演着重要角色,并且HVEF和低能N+复合处理的效果较N+单一诱变效果要好。

The correlation among survivor, mutation rate and dose（or influence） had been studied in low energy nitrogen ion beam implantation and HVEF treatment on Streptomyces Aureofaciens. Then the optimum treatment doses were determined： low-energy ion implantation of 1.82×10^15 ions . cm -2 dose and 2.86 × 10^15 ions . cm -2 dose at 10key and HVEF doses of 20s×0.5kv. cm-1,60s . 2kv . cm-5. With the optimization of HVEF doses and nitrogen ion doses to composite treatment on S. Aureofaciens, the result show that the positive mutation rates by composite treatment of some dose are much higher than that of single treatment of N ＋ ion at the same dose. The activities of POD, SOD, CAT were investigated at the high-yield strains M226 and D1114 and the original strain SL2 （CK）. The changes of POD, SOD, CAT activities were significantly different among the three strains. ： Dl114, M226, and CK. that the three enzymes played important roles in induced mutations and the effects of complex treatment of HVEF and N ＋ ion were more significantly than that of N ＋ ion single treatment.