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基于氧化钨的8 Mb高密度阻变存储器设计

Design of 8 Mb High Density Resistive RAM Based on WO_3
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摘要 设计了一款基于氧化钨的8Mb高密度阻变存储器,采用单晶体管开关、单电阻(1T1R)的存储器单元结构,设计了完整的存储单元、行列译码器、写驱动和灵敏放大器等关键模块。存储器芯片采用HHNEC 0.13μm 1P8M CMOS工艺流片。仿真结果表明,在8F2的高密度存储单元面积下,该存储器可实现准确的数据写入和读出功能。 An 8Mb high density resistive random access memory(RRAM)was designed based on WO3.The 1T1R(1transistor and 1resistive memory cell)RRAM contained memory cell,bitline and wordline decoder,write driver,and sense amplifier,etc.The RRAM was implemented in HHNEC 0.13μm 1P8M CMOS process. Simulation results showed that the RRAM with 8F2 high density memory cells could write and read information correctly at 1.8Vpower supply.
出处 《微电子学》 CAS CSCD 北大核心 2014年第2期241-244,共4页 Microelectronics
基金 国家高技术研究发展(863)计划资助项目(2011AA010403)
关键词 阻变存储器 写驱动 灵敏放大器 Resistive random access memory Write driver Sense amplifier
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参考文献7

  • 1WASER R, AONO M. Nanoionics-based resistive switching memories [J]. Nature Materials, 2007, 11 (6) : 833-840.
  • 2CHEN A, HADDAD S, WU Y C, et al. Non-volatile resistive switching for advanced memory applications [C] // IEDM Tech Digl Washington D C, USA. 2005 .. 746-749.
  • 3YANG J J, PICKE'I'T M D, LI X M, et al. Memristive switching mechanism for metal/oxide/metal nanodevice [J]. Nature Nanotechnology, 2008, 160(3).. 429-433.
  • 4LEEHY, CHENPS, WUTY, et al. Low power and high speed bipolar switching with a thin reactive Ti buffer layer in robust HfOz based RRAM [C]//IEEE Int Elec Dev Meet. San Francisco, CA, USA. 2008: 1-4.
  • 5金钢,吴雨欣,张佶,黄晓辉,吴金刚,林殷茵.基于0.13m标准逻辑工艺的1Mb阻变存储器设计与实现[J].固体电子学研究与进展,2011,31(2):174-179. 被引量:4
  • 6张估.高密度阻变存储器设计[D].硕士论文.上海:复旦大学,2010.
  • 7RAZAVI B. Design of analog CMOS and integrated circuit [M]. New York= McGraw-Hill Company Inc, 2001.

二级参考文献8

  • 1Yang J J, Pickett M D, Li X M, et al. Memristive switching mechanism for metal/oxide/metal nanode- vices[J]. Nature Nanotechnology, 2008,160(3) :429- 433.
  • 2Waser R, Aono M. Nanoionics-based resistive swi- tching memories[J]. Nature Materials, 2007,11 (6) : 833-840.
  • 3Wei Z, Kanzawa Y, Arita K, et al. Highly reliable TaOx ReRAM and direct evidence of redox reaction mechanism[C]. IEDM Tech Dig, 2008: 293-296.
  • 4Lee HY, Chen PS, WuTY, et al. Low power and high speed bipolar switching with a thin reactive Ti buffer layer in robust HfOz based RRAM[C]. IEDM Tech Dig, 2008:297-300.
  • 5Chen A, Haddad S, Wu Y C, et al. Non-volatile re- sistive switching for advanced memory applications [C]. IEDM Tech Dig, 2007:746-749.
  • 6Lee D, Seong D J, Jo I, et al. Resistance switching of copper doped MoO, films for nonvolatile memory ap- plications[J]. Applied Physics Letters, 2007,90(12) : 2104-2106.
  • 7Hogervost R, Tero J P, Eschauzier R G H, et al. A compact power-efficient 3-V CMOS rail-to-rail input/ output operational amplifier for VLSI cell libraries [J]. IEEE J Solid-state Circuits, 1994,29(12) : 1505- 1513.
  • 8Kinoshita K, et al. Reduction in the reset current in a resistive random access memory consisting of NiOx brought about by reducing a parasitic capacitance[J]. Appl Phys Lett, 2008,93 (3) : 3506-3508.

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