摘要
研究La0.4Sr0.6TiO3(LSTO)缓冲层和YBa2Cu3O7-δ(YBCO)超导厚膜的低成本制备技术。采用X射线衍射分析LSTO和YBCO膜的晶体取向,利用标准四引线法分析LSTO薄膜的导电性能和YBCO厚膜的超导性能。首先采用金属有机沉积法(MOD)成功在Ni-W基带上制备取向较好、表面光滑致密的LSTO缓冲层;然后采用电泳沉积(EPD)技术制备YBCO超导厚膜。研究电泳沉积电压和沉积时间对YBCO涂层性能的影响。结果表明:138V下电泳沉积35 min所制备的YBCO涂层,临界电流密度可达600 A/cm2(0 T,77 K)。
The preparation of La0.4Sr0.6TiO3 (LSTO) buffer layer and YBa2Cu3O7-δ(YBCO) superconducting thick film by a low cost technology was studied. The crystal orientation of LSTO and YBCO films was detected by X-ray diffraction, the conductivity of LSTO film and superconductivity of YBCO coating were investigated by standard four-probe method. Excellent in-plane alignment, smooth and dense LSTO buffer layer was successfully prepared on textured Ni-W taps by metal organic deposition (MOD). YBCO thick film was fabricated by electrophoretic deposition (EPD). The effects of applied voltage and deposition time on the YBCO coatings properties were studied. The results show that the critical current density of the YBCO coating deposited under 138 V for 35 min was about 600 A/cm2 (0 T, 77 K).
基金
Project(N100602010)supported by the Fundamental Research Funds for the Central Universities of China
关键词
导电缓冲层
超导厚膜
电泳沉积技术
YBCO
conductive buffer layer
YBCO
superconducting thick film
electrophoretic deposition