ITO靶材成形工艺的研究新进展

New Research Progress of Forming Process for Indium Tin Oxide Target

ITO靶材是高端液晶显示器、太阳能电池、导电玻璃等领域的主要材料之一,而ITO靶材的成形技术是关键环节。综述了冷等静压成形、冲压成形、模压成形、爆炸成形、挤压成形、凝胶注模成形等技术特点及研究状况,并重点介绍注浆成形的技术特点和研究进展。

Indium Tin Oxide （ITO） target is one of the main materials in many fields, such as high-end LCD, solar cells and conductive glasses ect, and forming process of ITO target is a key link. The technical characteristics and research status of forming processes, such as cold isostatic compaction, stamping process, die forming, explosive forming, extrusion forming, and gel-casting molding forming are summarized in this paper. It gives an introduction on the characteristics and research progress of slip casting.