摘要
从Au纳米粒子出发,利用竖直浸渍提拉法(dip-coating)成功将Au纳米粒子负载于基底(云母片/单晶硅片),并以3-氨丙基三甲氧基硅烷(APTMS)对单晶硅片进行改性,得到具有密度分布不同的Au纳米粒子two dimensional(2D)组装结构,制备方法简单易行。利用原子力显微镜(AFM)表征了不同制备条件下Au纳米粒子在基底表面的分布状态,结果表明,Au纳米粒子溶胶和偶联剂APTMS的浓度以及浸渍时间对Au纳米粒子在单晶硅片表面的密度分布起到决定性作用。
Through the dip-coating mode, Au nanoparticles were deposited on the mica and 3-aminopropyltrimethoxysilane modified silicon wafer, forming Au nanopartilces 2D-assembled structures with different density distributions. The distribution of Au nanoparticles on the substrates was characterized by atomic force microscopy (AFM) and the results showed that the concentrations of the Au nanoparticles sol and APTMS as well as the dipping time were the crucial factors to control the density distribution of Au nanoparticles on the silicon wafer.
出处
《电子显微学报》
CAS
CSCD
2014年第2期129-136,共8页
Journal of Chinese Electron Microscopy Society
基金
国家自然科学基金资助项目(No.21277009
No.21007002)
国家稀土稀有金属新材料和产业化专项-高性能稀土基汽车尾气催化器研发及国V催化器产业化
国家高技术研究发展计划(863计划
No.2011AA03A406)