摘要
基于全介质负滤光片设计理论,在近红外波段镀制宽带负滤光膜,通过对膜系理论的分析、材料蒸发工艺的研究、离子源参数的调整和优化,同时采用周期与非周期相结合的膜系设计,利用光控与晶控两种方法控制膜厚,制备出780nm^980nm波段平均透过率小于1%;500nm^780nm、980nm^2000nm波段平均透过率大于91%的宽带滤光膜,基本满足使用要求。
Based on the design theory of all-dielectric minus filters,this paper gives a method of coating broadband minus filtering film at near-infrared waveband. Through the analysis of coating design theory,the research of evaporation process of materials and the adjustment and optimization of parameters of ion source,it uses the design with the combination of period coating and no-period coating and controls the thickness of films by using light control and crystal control to develop the filtering film with less than 1% average transmittance at the band of 780nm ~ 980nm and higher than 91% average transmittance at the bands of 500nm ~ 780nm and 980nm ~ 2000nm,which basically meet the requirements.
出处
《长春大学学报》
2014年第4期439-441,共3页
Journal of Changchun University
关键词
光学薄膜
负滤光膜
膜系结构
离子辅助沉积
optical thin film
minus filtering film
coating structure
ion-assisted deposition