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酸铜添加剂CPP108开发和应用

Study and Application of CPP108-Copper Plating Additives
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摘要 开发了一种通盲孔匹配的电镀铜添加剂CPP108,此添加剂既可以用于板面电镀又能够用于图形电镀.研究了该体系的盲孔性能和通孔性能,并对其可靠性进行了测试.该体系具有高的通孔及盲孔贯孔能力,添加剂稳定可靠,易于控制.经过长期试验线的批量测试,于2010年5月成功用于上海美维电子有限公司电镀生产线. It is introduced one new copper plating additive-CPP108, which can be used for both panel plating and pattern plating. The performance and reliability were also investigated for both blind vias and through holes. The results show that our system has the advantage of high TP value for both blind vias and through holes. And the additive is stable and easy to control. After a large number of tests and long time running in trial-run line, it has been successfully used in mass production in Shanghai Meadville Electrics Co. , Ltd. since May 2010.
出处 《复旦学报(自然科学版)》 CAS CSCD 北大核心 2014年第2期198-204,209,共8页 Journal of Fudan University:Natural Science
关键词 电镀铜 盲孔 添加剂 可靠性 copper plating blind via additive responsibility
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参考文献10

  • 1周珺成,何为,周国云,王守绪.PCB盲孔镀铜填孔添加剂研究进展[J].印制电路信息,2012,20(7):35-39. 被引量:7
  • 2刘烈炜,郭沨,田炜,赵志祥.酸性镀铜添加剂及其工艺的发展回顾[J].材料保护,2001,34(11):19-20. 被引量:9
  • 3Cope B P, Harrover R E. Acid copper addition agent[P], US P: 2972572,1958-12-09.
  • 4黄令,辜敏,杨防祖.等.聚二硫二丙烷磺酸钠对铜电沉积初期行为的影响研究[C]//京津沪渝四直辖市第一届表面丁.程技术交流会论文集,重庆:第一届表面工程技术交流会,2002: 47-49.
  • 5钟琴,辜敏,李强.添加剂3-巯基-1-丙烷磺酸钠对铜电沉积影响的研究[J].化学学报,2010,68(17):1707-1712. 被引量:15
  • 6IX)W W P, Huang H S, Yen M Y, et al. Roles of chloride ion in microvia filling by copper electroposition[J],Elect rochem Soc,2005,152(2): C77-C88.
  • 7FengZV,Li X,Gewirth A A. Inhibition due to the interaction of polyethylene glycol,chloride, andcopper in plating baths: A surface-enhanced raman study[J]. Phys Chem B, 2003,107: 9415-9423.
  • 8Kazuo K,Toshiaki M, Keiji W. Role of additives for copper damascene electrodeposition experiment a 1-study on inhibition and acceleration effects[J]. Electrochemical Society * 2004,151(4) : C250-C255.
  • 9Kondo K. Yamakaw A N, Tanaka Z, et al. Copper damascene eletrodeposition and additives[J], Journalof Electroanalytical Chemistry , 2003,559: 137-142.
  • 10谢金平.PCB通孔镀铜添加剂[J].印制电路信息,2012,20(7):21-24. 被引量:4

二级参考文献56

  • 1许家园,杨防祖,谢兆雄,周绍民.酸性镀铜液中Cl^—离子的作用机理研究[J].厦门大学学报(自然科学版),1994,33(5):647-651. 被引量:26
  • 2辜敏,李强,鲜晓红,卿胜兰,刘克万.PEG-Cl^-添加剂存在下的铜电结晶过程研究[J].化学学报,2007,65(10):881-886. 被引量:20
  • 3[1]Allan C, Hamilton J. Acid Sulfate and Pyrophosphate Copper Plating[ J ]. Plating and Surface Finishing, 1995,82(8) :48
  • 4[2]Allan C. Hamilton J. Acid Sulfate and Pyrophosphate Copper Plating [ J ].Plating and Surface Finishing, 1997,84(8):47
  • 5[3]Homer J. Cyanide Copper Hating[ J]. Plating and Surface Finishing, 1999,86(11):36
  • 6[4]Pradhan N, Krishna P G, Dsa S C. Influence of Chloride Ion on Electrocrystallization of Copper[J] .Plating and Surface Finishing, 1996,83(3) :56
  • 7[5]Sunghee Y, Morton S, Ken N et al. Rotating Ring - Disk Electrode Studies of Copper Electrodeposition Effect of Chloride Ion and Organic Additives [J]. Plating and Surface Finishing, 1994,81 (12): 65
  • 8[6]Waston A. Acid Copper Electroplating Bath Containing Brightening and Leveling Additives[P]. U S Pat:4376685,1983- 03- 15
  • 9[7]Hans G. Electrodeposition of Copper from Acid Bath [ P]. U S Pat: 3770598,1972 - 01 - 21
  • 10[8]William E, Tcomas W. Acid Copper Plating and Additive Composition Therefor[ P]. U S Pat:4038161,1977 - 07 - 26

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