摘要
采用给 PECVD Si O2 中注入氮的方法 ,形成一薄层氮氧化硅 ,以此作为一种新型的扩散阻挡层 .不同热偏压条件下的 C- V测试结果和 XPS分析结果表明 。
The barrier to the copper diffusion is one of the key technologies in copper metallization. A novel barrier has been presented, which is a thin film of silicon oxynitride formed by implanting nitrogen into PECVD silicon dioxide. The method proved highly effective to block the copper diffusion after high frequency C V measurements at different BTS (Bias Thermal Stress) conditions and the XPS (X ray Photoelectron Spectroscopy) analysis. Furthermore, this method has the advantage of simplifying the damascene process of copper metallization, which has also been analyzed and discussed in detail.
基金
国家自然科学基金资助项目 !(批准号 :6993 60 2 0 )&&
