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平面工艺辐射探测器的研制 被引量:3

Fabrication of Si Radiation Detector with Plane Technology
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摘要 使用高阻 Si材料 ,通过氧化、光刻、注入和退火工艺技术研制粒子探测器—— PIN二极管 .采取 HCl氧化、慢降温等工艺措施可减小 PIN二极管的暗电流 (反向电流 ) ,这对于提高器件性能起到了关键作用 .电压为 - 5 V时 ,探测器的暗电流可达 n A/ cm2 量级 . The fabrication of PIN silicon detector has been described in details with some advanced microelectronic technologies,including oxidation,lithography and implantation and annealing.Slowly decrease the temperature after HCl handling,a low dark current (reverse current) can be obtained.At -5V,the performanc of the detector is perfect,and the leakage current is 10nA/cm 2.The relationship between the dark current and the minority carrier lifetime has also been discussed,as well as the measuring method of the minority carrier lifetime.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2001年第3期354-357,共4页 半导体学报(英文版)
关键词 PIN二极管 少子寿命 平面工艺 辐射探测器 PIN diode dark current recombination center minority lifetime
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参考文献3

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同被引文献12

  • 1陈鸿飞,邹积清,田大宇,张太平,宁宝俊,张录.离子注入PIN辐射探测器的测试分析[J].核电子学与探测技术,2005,25(5):457-460. 被引量:4
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  • 10于向前,陈鸿飞,邹积清,施伟红.空间粒子辐射探测器高压电源设计[J].核电子学与探测技术,2008,28(3):529-532. 被引量:9

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