摘要
文章用射频磁控反应溅射法,以钨靶为溅射靶材,在玻璃和ITO衬底上分别制备了WO3薄膜,氧气和氩气的流量比值为5∶25,工作气压为1.5Pa,所有样品均进行了400℃保温1h的退火。通过改变溅射功率,研究了功率对WO3薄膜的相组成、表面形貌、可见光透过率的影响,最终得到溅射功率为100~70 W的WO3晶态薄膜的电致变色性能最好。
Using the tungsten with purity of 99.99% as target,WO3 thin film was deposited on glass and ITO substrates by radio frequency（RF）reactive magnetron sputtering method.The flow ratio of O2 to Ar was 5∶25,and the pressure was 1.5Pa.All samples were annealed at 400℃for 1h.The influence of different input power on the phase composition,morphology and visible light transmittance of WO3 thin film was investigated.The experimental result indicates that the electrochromic property of crystalline WO3 thin film is the best when the input power is 100 Wfirstly,and then 70W.
出处
《合肥工业大学学报（自然科学版）》
CAS
CSCD
北大核心
2014年第5期534-537,共4页
Journal of Hefei University of Technology：Natural Science
基金
国家"973"计划资助项目(2008CB717802)
安徽省自然科学基金资助项目(090414182)
安徽省高等学校自然科学研究基金资助项目(KJ2009A091
KJ2012A228)
关键词
晶态WO3薄膜
射频磁控反应溅射
透过率
电致变色
crystalline WO3 thin film
radio frequency（RF）reactive magnetron sputtering
transmittance
electrochromism
