沉积温度对NbN膜层微观结构的影响

THE INFLUENCES OF DEPOSITION TEMPERATURE ON THE MICROSTRUCTURE OF NIOBIUM NITRIDE FILMS

利用有磁过滤器的等离子体沉积装置 ,在不同温度的Si基底上沉积氮化铌 (NbN)薄膜 ,通过XRD ,XPS ,SEM等分析 ,研究了NbN薄膜的表面形貌与微观结构跟温度的关系 .发现沉积温度对择优取向有较强的影响 :从室温到约 30 0℃得到的薄膜在 (2 2 0 )峰表现出很强的择优取向 ,50 0℃ (2 2 0 )峰变得很弱 ,(2 0 0 )峰表现出择优取向 ,但不明显 .同时 ,膜层中N和Nb的原子比先随温度的升高而升高 ,后稍有降低 .温度升高 ,δ NbN的晶粒变大 .室温到 30 0℃很难得到完整的NbN膜 ,而在 50 0℃得到的薄膜完整且光滑 ,膜层中得到单一的δ

Filtered vacuum arc plasma deposition apparatus is used to deposit NbN thin films on Si substrate at different temperatures ranging from room temperature(RT) to about 500 ℃. The influences of deposition temperature on the microstructure and morphology of the coatings are studied using XRD, XPS and SEM. It is shown that the deposition temperature has a strong effect on preferred orientation. At the range of RT to 300 ℃, δ NbN phase has a preferred orientation on (220) peak; and at the substrate temperature of about 500 ℃, δ NbN phase (200) peak becames preferred with the intensity of (220) peak decreasing badly. The atomic ratio of N and Nb in the coatings enhances with the increasing deposition temperature at first, and then reduces in a way. The grain size of δ NbN is larger when deposition temperature becames higher. From RT to 300 ℃ a full coating could not obtained, and when the temperature is increased to 500 ℃ a full and smooth film consisting of single phase δ NbN is fabricated.