多弧离子镀CrN薄膜的耐腐蚀性能

Corrosion Resistance of CrN Film Prepared by Multi-Arc Ion Plating

单相CrN薄膜较难制取,国外已形成商用,而国内相关研究尚处于起步阶段。采用多弧离子镀技术在45钢表面沉积CrN薄膜,通过扫描电镜观察了CrN薄膜的表面形貌,采用X射线衍射仪对其相结构进行了分析,分别讨论了CrN薄膜在3.5%NaCl溶液、1 mol/L NaOH溶液和1 mol/L H2SO4溶液中的电化学腐蚀性能,在其他制备参数不变的条件下,考察了氩氮流量比对薄膜组织结构以及性能的影响。结果表明:随着氩氮流量比的减小,CrN薄膜表面的液滴尺寸和数目逐渐减小;薄膜主要以CrN相为主,随着氩氮流量比的增大,CrN(110)的峰值逐渐减弱,CrN(200)的峰值逐渐增强;随着氩氮流量比的减小,CrN薄膜在3.5%NaCl溶液、1 mol/L NaOH溶液和1mol/L H2SO4溶液中的耐蚀性均得到提高,在氩氮流量比1∶3时,薄膜的耐腐蚀性最佳。

CrN film was deposited on 45 steel by multi-arc ion plating. The morphology of as-plated CrN film was observed with a scanning electron microscope,and its phase structure was analyzed with an X-ray diffractometer. Moreover,the electrochemical corrosion behavior of the CrN film in 3. 5% NaCl solution,1mol /L NaOH solution and 1 mol /L H2SO4 was evaluated,and the effect of Ar /N2 flow rate on the structure and properties of the CrN film was investigated while the other parameters were fixed.Results showed that the size and amount of the liquid droplets on the surface of CrN film tended to gradually decrease with declining Ar /N2 flow rate. As-plated CrN film mainly consisted of CrN phase. The diffraction peak intensity of the(110) plane gradually declined with increasing Ar /N2 flow rate,while that of the(200) plane gradually enhanced therewith. With the decrease of Ar /N2 flow rate,the corrosion resistance of CrN film in 3. 5%NaCl solution,1 mol /L NaOH solution and 1 mol /L H2SO4 solution increased. Particularly,CrN film obtained at an Ar /N2 flow rate of 1 ∶ 3 had the best corrosion resistance.