期刊文献+

基于显微光杠杆技术的微结构偏转角测量系统 被引量:5

Deflection angle measurement system for microstructure based on microscope optical lever
原文传递
导出
摘要 针对微结构的偏转角度测试需求,设计并搭建了一套基于显微光杠杆技术的角度测量系统。该系统将光杠杆光路与无限共轭显微光路相结合,所得聚焦光斑直径小于10μm;采用电流模式电路处理四象限探测器输出信号,系统理论带宽超过5MHz;系统对微结构的转角测量分辨力和理论量程分别可达1.2″和±4°。利用该系统测量了原子力显微镜微悬臂梁探针在步进载荷下的偏转情况,测量结果与铁摩辛柯梁理论计算一致,验证了系统的可靠性。 A microscope system for the deflection angle measurement of microstructures is presented. The micro- scope consists of an infinite conjugate imaging system and an integrated optical lever. The laser beam of the optical lever is focused by the infinite objective to a size less than 10μm. A current-mode circuit is designed for signal processing for the optical lever, and 5 MHz in bandwidth is achieved. The measurement range and resolution of the system are ±4° and 1.2″, respectively. As a test, the system is used to measure the deflection angles at the free end of a cantilever probe of atomic force microscope under step load. The measurement results are consistent well with the calculation by using Timo- shenko beam theory.
出处 《光学技术》 CAS CSCD 北大核心 2014年第3期219-224,共6页 Optical Technique
基金 国家自然科学基金(61204117 51075297) 863计划项目(2012AA041204)
关键词 光学测量 微结构 光杠杆 偏转角 电流模式 optical measurement microstructure optical lever deflection angle current-mode
  • 相关文献

参考文献20

  • 1张琢,李鹏生,强锡富,任顺清,陈军.测角技术国内外发展概况[J].宇航计测技术,1994,13(4):4-11. 被引量:13
  • 2浦昭邦,陶卫,张琢.角度测量的光学方法[J].光学技术,2002,28(2):168-171. 被引量:57
  • 3Wen Fung Jacky, Chung Po Sheun. The use of Circular Dam- mann Grating (CDG) in angle measurement[C]. Conference on Lasers and Electro-Optics (CLEO) , JWA,2008.
  • 4张彩妮,王向朝.微角度的光学测量[J].光电子.激光,2002,13(4):416-419. 被引量:20
  • 5Jabconaki R. Angle interference measurement[C]. Processing of the International Synposiumon Metrology for Quality Control in Production, Tokyo. 1984: 184-189.
  • 6郑德锋,王向朝,唐锋.An improved method of angle measurement with a position sensitive detector[J].Chinese Optics Letters,2007,5(7):403-406. 被引量:4
  • 7Shi P, Stijns E. Improving the linearity of the Michelson inter- ferometric angular measurement by a parameter compensation method[J]. Applied Optics, 1993, 32(1): 44-51.
  • 8Meyer G, Amer N M. Novel optical approach to atomic forcemicroscopy[J]. Appl. Phys. Lett., 1988, 53(12): 1045- 1047.
  • 9Ando T. High-speed atomic force microscopy coming of age [J]. Nanotechnology, 2012, 23(6): 062001.
  • 10Putman C A J, de Grooth B G. A theoretical comparison be- Lween interferometric and optical beam deflection technique for :he measurement of cantilever displacement in AFM[J]. Ultra- nicroscopy, 1992, 42-44: 1509-1513.

二级参考文献82

共引文献181

同被引文献45

  • 1高彦丽,杨蓓,邵富群,章勇高.用于ECT系统的低成本、宽带微小电容测量电路[J].电测与仪表,2004,41(9):29-32. 被引量:9
  • 2王碧波,岳金福,周泽兵,彭益武.基于二维精密电容微位移传感器的二维纳米定位系统[J].纳米技术与精密工程,2005,3(2):137-141. 被引量:19
  • 3薛向东,吴黎明,邓耀华,伍冯洁,何仲凯.IC晶片关键尺寸标定的新方法研究[J].半导体技术,2005,30(12):35-37. 被引量:4
  • 4Baravelli E, Dixit A, Rooyackers R, e! al. Impaet of line- edge roughness on FinFET matching performance~ Jl- IEEE Trar~actions on Electron Devices, 2007, 54 ( 9 ) : 2466- 2474.
  • 5Cho S J, Ahn B W, Kim J, et al. Three-dimensional ima- ging of undercut and sidewall structures by atomic force mi- croscopy [ J ]. Review of Scientific Instruments, 2011, 82 (2) : 023707.
  • 6Hua Y, Buenviaje-Coggins C, Lee Y, et al. New three-di- mensional AFM for CD measurement and sidewall character- ization [ C ]//Proc SPIE 7971 , Metrology, Inspection, and Process Control for Microlithography. XXV, 797118. San Jose, California, USA, 2011. DOI: 10. 1117/12. 879545.
  • 7Martin Y, Wickramasinghe H K. Method for imaging side- walls by atomic forc, e microscopy [ J ]. Applied Physics Let- ters, 1994, 64(19) : 2498-2500.
  • 8Murayama K, Gonda S, Koyanagi H, et al. Critical-dimen- sion measurement using multi-angle-seanning method in atomic force microscope [ J ]. Japanese Journal ~f Applied Physies, 2006, 45(7): 5928-5932.
  • 9Foucher J, Rana N, Dezauzier C. 3D-AFM enhancement for CD metrology dedicated to lithography sub-28-nm node re- quirements[ C ]// Proc SPIE 7638, Metrology, Inspection, and Process Control for Microlithography. XX I V, 763802. San Jose, California, USA, 2011. DOI: 10. 1117/12. 846550.
  • 10Dai G, H~.ssler-Grohne W, Hiiser D, et al. New develop- ments at PTB in 3D-AFM with tapping and torsion AFM mode and vector approach probing strategy [ C ]//Proc SPIE 8036, Scanning Microscopies 2011 : Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life,Environmental, and Industrial Sciences, 80360V.Orlando, Florida, USA, 2011. DOI: 10. 1117/12.884657.

引证文献5

二级引证文献7

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部