一氧化二氮的光电离质谱研究

A Study of Photoionization Mass Spectrometry of Nitrous Oxide

在入射电子能量 2 50 0eV、能量分辨 2 0 0meV的条件下测量了一氧化二氮分子在 7.8～2 4 .5eV的光学振子强度密度谱和光电离质谱 ,报道了N2 O+、NO+、O+、N2 +和N+等离子在较高能量分辨下的部分光学振子强度密度 ,首次给出了一氧化二氮分子在 13.0～ 2 1.0eV能区中性解离的振子强度密度。并在对这些数据进行分析的基础上阐述了一氧化二氮分子超激发态的不同退激发道的竞争过程。

The absolute optical oscillator strengths density spectrum and photoionization mass spectrometry of nitrous oxide in the energy region of 7.8～24.5eV have been measured at an impact energy of 2500eV with the FWHM 200meV. Values of the partial photoionization oscillator strengths density of N 2O +, NO +, O +, N 2 + and N + are reported and values of the oscillator strengths density for neutral dissociation in the energy region of 13.0～21.0eV are reported for the first time. The competition among different decay channels of the superexcited states of nitrous oxide is expatiated.