多次纺丝与退火对ITO薄膜表面均匀性的影响

Surface Uniformity of ITO Thin Films Prepared by Repeatedly Electro-spinning and Annealing

通过多次纺丝与退火工艺在普通玻璃载玻片上制备ITO透明导电薄膜,研究了退火工艺对薄膜表面形貌的影响。结果表明:退火不仅提高了ITO颗粒的洁净程度,同时减小了其在薄膜表面的粒径分布。多次纺丝与退火可以提高ITO颗粒的覆盖密度,得到致密性比较好、表面缺陷比较少、表面粗糙度比较小、均匀平整的透明导电薄膜。

ITO Transparent conductive thin film on slide glass was prepared by multiple electro-spinning and annealing process .The results indicate that that annealing promotes crystallinity and reduces size distribution of ITO particles.As the result, uniform and smoothing thin film of high loading of ITO particles can be obtained with less surface defects and small roughness .