摘要
纳米多层膜的物理性能和力学性能的异常效应均与其调制结构有关。采用X射线能量分散谱仪 (EDS)成分分析方法对不同调制周期和调制比的W /Mo纳米多层膜进行表征 ,并与透射电子显微分析 (TEM)和X射线衍射分析 (XRD)方法进行了比较。结果表明 :采用EDS成分分析方法 ,可以表征纳米多层膜的调制比。EDS方法与XRD分析相结合 ,可以方便而准确地表征纳米多层膜的调制结构。
The abnormal effects of physical and mechanical properties of nano?multilayers result from their modulation structure.The nano?multilayers of W/Mo with different modulation periods and ratios are characterized by EDS composition analysis and the results are compared with ones by TEM and XRD analysis.The research demonstrates that the modulation ratio of murtilayers can be identified by EDS Composition analysis.Combining with XRD technique,EDS Composition analysis method can Characterize the modulation structure of nano?multilayers accurately and conveniently.
出处
《微细加工技术》
2001年第1期57-61,共5页
Microfabrication Technology
关键词
纳米多层膜
调制结构
表征方法
EDS
nano-multilayers
modulation structure
characterization method
EDS
