高线密度X射线双光栅的研制

Design and Fabrication of High-Line-Density Dual Gratings for X-Rays

研究了采用高分辨率的100 kV电子束光刻和光学光刻系统相结合制作高线密度X射线双光栅的工艺技术,并且分析了电子束邻近效应校正技术在高线密度光栅制备中的应用。首先,利用电子束曝光和纳米电镀技术在同一衬底上制备两种不同线密度光栅图形;然后,利用光学光刻在2 000 lp/mm光栅上制备了自支撑加强筋结构。通过此技术制备的X射线双光栅成功集成了高线密度5 000 lp/mm透射光栅和2 000 lp/mm自支撑透射光栅,其栅线宽度分别为100和250 nm,金吸收体厚度达到400 nm。

The design and manufacture of high-line-density X-ray dual gratings using the high resolution electron beam lithography of 100 kV and optical lithography systems were researched, and the application of the correction technique for the electron beam proximity effect in the preparation of the high linear density gratings was analyzed. Firstly, two different line density transmission grating patterns were fabricated on a substrate by the electron beam lithography and nano-electroplation. Secondly, the self-standing strengthened structures were fabricated on the 2 000 lp/mm transmission grating by the optical lithography. With the combined technology, the X-ray dual gratings consisting of the 5 000 lp/mm transmission grating and 2 000 lp/mm selfstanding transmission grating were successfully fabricated. The grating widths are 100 nm and 250 nm, respectively, and the Au grating bar thickness is 400 nm.