金属有机源化学气相沉积法生长氧化锌薄膜中氢气的作用及其机理

Influence and mechanism of H_2 in the epitaxial growth of ZnO using metal-organic chemical vapor deposition method

本文重点探讨了金属有机源化学气相沉积生长ZnO薄膜中氢气的作用与机理.研究表明氢气对ZnO薄膜的结构与性质具有重要的影响.当采用叔丁醇为氧源时,氢气对ZnO薄膜的晶体质量,表面结构和发光性质主要产生负面的影响,同时发现氢气的加入有助于抑制碳的沾污.而当采用笑气为氧源时,测量显示表面变光滑,晶体质量得到提高,发光强度也得到提升.氢气在笑气作为氧源生长ZnO的过程中基本起到了正面的作用.论文最后从氢气降低生长表面能量,提高表面原子迁移能力但存在表面腐蚀作用的方向以上结果给予了较好的解释.研究显示MOCVD生长高质量ZnO薄膜中氢气的优化具有特别重要的意义.

This paper focuses on the influence and mechanism of H2 in the eptaxial growth of ZnO using metal-organic chemical vapor deposition method. Studies show that hydrogen has a significant influence on the structure and properties of ZnO films. Hydrogen produces a mainly negative impact on crystal quality, surface structure, and optical properties of ZnO films when tert-butanol （t-BuOH） is used as the O sources. Raman scattering shows that hydrogen has a very good effect on the suppression of carbon contamination. When nitrous oxide is used as the O sources, the surface of ZnO films becomes smooth, and the crystal quality and optical property are improved. It is shown that hydrogen can play a positive role when N2O is used as O source. In this paper we highly estimate hydrogen＇s ability of reducing the surface growth energy, improving the migration of the surface atoms and the corrosion effect on the surface. Studies show that the optimization of hydrogen has a significant effect during the epitaxial growth of ZnO using the MOCVD method.