氧分压对动态离子束辅助沉积合成的氧化钛膜的影响

Effect of O2 pressure on the synthesis of titanium oxide film y ion beam enhanced deposition

采用离子束增强沉积的方法，改变氧分压，在硅基体表面制备出了不同组分及不同取向的 氧化钛薄膜。采用 XRD，掠角衍射以及 XPS分析方法对薄膜的成分、结构和取向进行了分析，并 通过 RBS分析计算出了薄膜的 O/Ti比。实验结果发现，所制备的氧化钛薄膜为具有一定择优取 向的多晶膜，薄膜内 TiO、 Ti2O3和 TiO2共同存在。当氧分压低于 8.4× 10-4 Pa时，氧化钛薄膜的 成分以 TiO为主，且 TiO的取向随氧分压的增加从（ 220）向（ 031）转变，氧分压对薄膜取向的影响 较大。当氧分压高于 8.6× 10-4 Pa时，氧化钛薄膜的成分以具有（ 100）择优取向的金红石型 TiO2 为主，含有少量其他结构的 TiO2和低价 Ti，其成分及取向相对较为稳定，对氧分压的变化不敏感。

A series of titanium oxide thin films have been synthesized on silicon wafers by ion beam en- hance deposition at different O2 pressure. X-ray Photo-electron Spectroscopy, X-ray diffraction (XRD), glancing angle diffraction and Rutherford backscattering spectroscopy(RBS) were used to analyse the composition, structure and orientation of the film. It was found that: 1) The film is polycrystal-line with Ti2＋ , Ti3＋ , Ti4＋ coexist. 2) When O2 pressure is lower than 8.4× 10-4 Pa, the main composition of the film is TiO that preferred orientation changed from (220) to (031) with the increase of O2 pressure. 3) When the O2 pressure is above 8.6× 10-4 Pa, rutile TiO2 with a preferred orientation of (100) is foundto be the major composition of the film.