摘要
针对 Ni80Fe20/Mo纳米多层膜在实际应用中经常面临的热稳定性问题 ,研究了多层膜在 343~683K温度范围内的互扩散行为,测定了其有效互扩散系数 Dλ。小的激活焓来源于多层膜中存在的共格应变。当温度低于 483K时 , NiFe/Mo多层膜具有较强的抵制 NiFe和 Mo亚层间互扩散能力 , 这对 NiFe/Mo多层膜今后的实际应用有重要意义。
For improving the thermal stability of magnetic multilayers, the interdiffusion of Ni80Fe20/Mo multilayers between 343~ 683K has been studied by determining the effective interdiffusion coefficient Dλ . The much lower activation enthalpy of diffusion is attributed to the coherence strains existing in the multilayers. As the annealing temperature is below 483K, this result suggests that the Ni80Fe20/ Mo multilayers have a strong resistance to the atomic interdiffusion between sublayers. It is signifi- cant to application of NiFe/Mo multilayers.
出处
《功能材料与器件学报》
CAS
CSCD
2001年第1期63-68,共6页
Journal of Functional Materials and Devices