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N-Al共掺杂4H-SiC的第一性原理计算 被引量:2

First Principle Calculation of N-Al Co-doped 4H-SiC
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摘要 采用基于密度泛函理论的第一性原理平面波超软赝势方法,计算本征、N单掺杂、Al单掺杂及N-Al共掺杂4H-SiC的电子结构和光学性质。结果表明:N-Al共掺杂导致4H-SiC晶格膨胀,4H-SiC的禁带宽度减小,同时在4H-SiC禁带中引入了杂质能级;N、Al的单掺杂增加了4H-SiC对红外波段和可见光波段的响应,N-Al共掺杂不存在该现象;N-Al共掺杂4H-SiC较本征4H-SiC在紫外波段出现一个更大的透射窗口,吸收系数略小于本征4H-SiC的。 Electronic structures and optical property of pure 4H-SiC,N doped,Al doped and N-Al co-doped 4H-SiC were calculated using the plan wave ultra-soft pseudopotential method based on the density functional theory. The results indicate that the lattice is expanded and the forbidden band width is decreased due to the doping. The doping introduces impurity energy into the forbidden band. Doping of N or Al extends the visible and infrared absorption of 4H-SiC. The N-Al co-doped 4H-SiC does not show this phenomenon and has a winder transmission window and a lower absorption coefficient in ultraviolet band than the pure 4H-SiC.
出处 《中国粉体技术》 CAS 北大核心 2014年第3期70-75,共6页 China Powder Science and Technology
基金 河北省自然科学基金项目 编号:E2012201088 F2013201196
关键词 第一性原理 掺杂 光学性质 first principle doping optical property
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  • 1史瑞,陈治明.4H-SiC紫外光光电晶体管模拟与分析[J].西安理工大学学报,2011,27(1):1-6. 被引量:4
  • 2BWNMOUSSA A, SOLTANI A, HAENEN K, et al. Recent developments of wide-bandgap semiconductor based UV sensors[J] Diamond and Related Materials, 2009, 18 (5/6/7/8): 860-864.
  • 3YANG Weifeng, ZHANG Feng, LIU Zhuguang, et al. Effect of annealing on the performance of 4H-SiC metal-semiconductor-metal ultraviolet photodetectors[J]. Materials Science in Semiconductor Processing, 2008, 11 (2): 59-62.
  • 4MONROY E, OMNES F, CALLE F. Wide-bandgap semiconductor ultraviolet photodetectors[J]. Semiconductor Science and Technology, 2003, 18 (4): 33-51.
  • 5PEARTON S J, ZOLPER J C, SHUL R J, et al. GaN: processing defects and device[J]. Journal of Applied Physics, 1999, 86( 1 ): 1-78.
  • 6王刚,宋波,刘宇,等.A1掺杂SiC的磁性研究[C]//第15届全国晶体生长与材料学术会议论文集,2009:120.
  • 7SONG B, BAO H, LI H. Observation of glassy ferromagnetism in Al-doped 4H-SiC[J]. Journal of the American Chemical Society, 2009, 131 (4): 1376-1377.
  • 8郭小伟,罗荣辉,张操,刘小玲,楚广勇,霍艳芳.氮掺杂对4H-SiC电子结构的影响[J].激光杂志,2011,32(6):20-22. 被引量:4
  • 9贾仁需,张义门,张玉明,王悦湖,栾苏珍.Al掺杂4H-SiC同质外延的缓冲层[J].固体电子学研究与进展,2009,29(2):306-309. 被引量:1
  • 10van DULIN-AMOLD A, ZONDERVAN R, SCHMIDT J. Electronic structure of the N donor center in 4H-SiC and 6H-SiC[J]. Physical Review: B, 2001,64 (8): 085206-1-085206-17.

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