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A low specific on-resistance SOI LDMOS with a novel junction field plate 被引量:3

A low specific on-resistance SOI LDMOS with a novel junction field plate
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摘要 A low specific on-resistance SO1 LDMOS with a novel junction field plate (JFP) is proposed and investigated theo- retically. The most significant feature of the JFP LDMOS is a PP-N junction field plate instead of a metal field plate. The unique structure not only yields charge compensation between the JFP and the drift region, but also modulates the surface electric field. In addition, a trench gate extends to the buffed oxide layer (BOX) and thus widens the vertical conduction area. As a result, the breakdown voltage (BV) is improved and the specific on-resistance (Ron,sp) is decreased significantly. It is demonstrated that the BV of 306 V and the Ron,sp of 7.43 mΩ.cm2 are obtained for the JFP LDMOS. Compared with those of the conventional LDMOS with the same dimensional parameters, the BV is improved by 34.8%, and the Ron,sp is decreased by 56.6% simultaneously. The proposed JFP LDMOS exhibits significant superiority in terms of the trade-off between BV and Ron,sp. The novel JFP technique offers an alternative technique to achieve high blocking voltage and large current capacity for power devices. A low specific on-resistance SO1 LDMOS with a novel junction field plate (JFP) is proposed and investigated theo- retically. The most significant feature of the JFP LDMOS is a PP-N junction field plate instead of a metal field plate. The unique structure not only yields charge compensation between the JFP and the drift region, but also modulates the surface electric field. In addition, a trench gate extends to the buffed oxide layer (BOX) and thus widens the vertical conduction area. As a result, the breakdown voltage (BV) is improved and the specific on-resistance (Ron,sp) is decreased significantly. It is demonstrated that the BV of 306 V and the Ron,sp of 7.43 mΩ.cm2 are obtained for the JFP LDMOS. Compared with those of the conventional LDMOS with the same dimensional parameters, the BV is improved by 34.8%, and the Ron,sp is decreased by 56.6% simultaneously. The proposed JFP LDMOS exhibits significant superiority in terms of the trade-off between BV and Ron,sp. The novel JFP technique offers an alternative technique to achieve high blocking voltage and large current capacity for power devices.
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第7期686-690,共5页 中国物理B(英文版)
基金 supported by the National Natural Science Foundation of China(Grant No.61376079) the Postdoctoral Science Foundation of China(GrantNo.2012T50771) the Postdoctoral Science Foundation of Chongqing City,China(Grant No.XM2012004)
关键词 LDMOS RESURF field plate breakdown voltage specific on-resistance LDMOS, RESURF, field plate, breakdown voltage, specific on-resistance
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同被引文献65

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