高温超导薄膜射频溅射靶的简便制作

Preparation of Radio-Frequency Sputtering Target for High Tc Superconductive Film of Bi-Sr-Ca-Cu-O

本文报导了一个极其简便的高温超导薄膜溅射靶的制作方法。并制得可控制名义组分的Bi-Sr-Ca-Cu-O的超导薄膜,其T_(CM)温度为84K,零电阻温度为60.3K。

An extremely simple and convenient method of preparing radio-frequencysputtering target for high Tc superconductive film in the Bi-Sr-Ca-Cu-O withcontrolled component ratio is reported. The film transition temperature ismeasured to be around 84K and non-resistance temperature is at about 60. 3K.