摘要
在高频直流脉冲放电的条件下 ,对低气压放电过程中存在的弧光放电的发展过程进行了研究 ,揭示了脉冲放电频率的提高对抑制弧光放电的发展是有效的 ,而快速的弧光放电检测和保护电路是不可缺少的 .
The development of arc\|discharge was studied under the condition of high frequency pulse discharge. The result is obtained that the capability to restrain arc\|discharge becomes better while pulse frequency of the power supply raise ,and that fast arc\|discharge detecting and circuit protecting is needed. Some valid bases are given for the design of high frequency plasma pulse power supply.
出处
《中南民族学院学报（自然科学版）》
2001年第1期1-4,共4页
Journal of South-Central University for Nationalities(Natural Sciences)
基金
国家民委科研基金资助项目!( MZY990 0 1)
