等离子化学气相沉积(PCVD)TiN涂层的组织与性能研究

Study on the Structures and Properties of the TiN Layer Deposited by Plasma Chemical Vapour Deposition

本文用透射电镜和x光衍射仪揭示了PCVD法TiN涂层的物相及超细晶粒、位错、择优取向等微观结构,并对该涂层的性能进行了比较试验。

The microstructures of the deposited TiN coating layer by plasmachemical vapour deposition (PCVD) are revealed by transmissionelectron microscopy and x-ray diffraction. Comparative tests forthe properties of the TiN coating layer are studied.