摘要
本文主要阐述了光刻技术的发展极限及 193nm、 157nm光学光刻技术和电子束投影光刻 (SCALPEL)、X -射线光刻 (XRL)离子投影光刻 (IPL)等技术的发展趋势。并详细介绍了国际著名品牌的光刻机以及即将推出的新一代光刻机。对国内光刻设备的发展现状作了简要概述。
The limitation of photolithography technology and the trend of 193nm,157nm photolithography technology,SCALPEL,x ray photolithography,and IPL are analyzed in the article.The international brand named photolithography equipmemt and the ready to ship new generation of photolithography equipment are also introduced,and the current status of domestic photolithography equipmemt is briefly mentioned.
出处
《微电子技术》
2001年第2期8-17,共10页
Microelectronic Technology
关键词
光刻技术
光刻设备
电子束投影光刻
光学光刻
Photolithography
Microelectronic technology
Specific equipment
Limitation
