摘要
本文主要对亚微米工艺设计规则进行探讨 ,旨在促进设计公司与Fab厂家之间信息反馈 ,共同努力并顺利进入亚微米和深亚微米领域。
The design rule of submicron technology is discussed in the paper,the prupose is to promote the liaison of information between design centers and Fabs,and to help them to cooperate well and to enter the sphere of submicron or deep submicron technology successfully.
出处
《微电子技术》
2001年第2期28-32,共5页
Microelectronic Technology
关键词
亚微米工艺
设计规则
集成电路
微电子
Submicron technology
Design rule
Yield
Photolithography
Etch
