大规模集成电路膜厚测量仪器校准检定初步探索

Study on Technology for Calibrating Film Thickness Measurement Instrument in Semiconductor Manufacture

在半导体圆片制造过程中 ,膜厚 (SiO2 、SiN、多晶Si等 )测量是非常重要的工艺参数。本文介绍了几种主要的膜厚测量仪器以及这些仪器的校准检测方法 ,并着重介绍了校准用膜厚标准的制定及应用。

Film thickness (SiO 2, SiN and polisilicon, etc.) is an extremely important parameter in semiconduct Wafer processing.This paper describes several main film thickness measurement tools with focus on the development and application of film thickness standard materials for calibration purposes.