摘要
投影光刻技术的计算机模拟分为三部分：空间像强度分布计算，曝光计算和显影计算。本文分别讨论了各部分数学模型的建立，计算方法及特点，并给出了一些研究结果。
The Simulation of projection llthography technology can be divided into three parts: calculating of aerial image intensity distribution exposure and development of resist. ln this paper the establishment of mathematic models, algorithms and characteristics of every part are discussed,respectively. Some results obtained are given.
出处
《微细加工技术》
EI
1996年第4期23-31,共9页
Microfabrication Technology
关键词
投影光刻
计算机模拟
光刻技术
projection lithograpby
computer simulation
resist exposure
resist development
