光学邻近校正改善亚微米光刻图形质量

Optical proximity correction for improving pattern quality in submicron photolithography

论述了近年来光学邻近校正技术的进展，讨论了各种行之有效的改善光刻图形质量的校正方法，并分析了邻近效应校正在未来光刻技术中的地位和作用。

In this paper, the development of optical proximity correction technique is preserted. The various methods of optical proximity correction for improving the lithography pattern quality are discussed. The function and the position of optical proximity correction on lithography technology in future are analyzed.