摘要
高的表面粗糙度和厚度的不均匀性影响了 CVD金刚石膜的应用 ,而抛光可以减少这些缺点。近年来 ,发展了许多 CVD金刚石膜的抛光技术 ,而且不同的抛光技术都有其优缺点。本文总结了 CVD金刚石膜的各种抛光技术及其特点 ,并提出了一种新的抛光技术。
Chemically vapor-deposited(CVD) diamond films have rough surface and non-uniform thickness which can adversely affect their application.Polishing can be used to remedy these drawbacks.In recent years,many polishing techniques have been reported,each having technological advantages and disadvantages.Polishing techniques and their characters are reviewed in this paper.A new set-up thermochemical polishing of CVD diamond films has been developed.
出处
《表面技术》
EI
CAS
CSCD
北大核心
2001年第1期15-18,共4页
Surface Technology