氧化物超导簿膜的成型技术

PATTERNING PROCESS OF OXIDE SUPERCONDUCTING FILMS

本文介绍了Y-Ba-Cu-O(YBCO)高Tc超导膜的两种成型方法:化学湿法刻蚀和剥离光刻技术。在化学蚀刻方法中,发现腐蚀液H_3PO_4/H_2O的腐蚀速率R与浓度γ的关系可粗略地描述为R(?)γ(γ≤50％),通过选择合适的溶液浓度,腐蚀速率较容易调整,在适当的腐蚀条件下,侧向腐蚀很小。剥离工艺不仅适合于加工细线条,还可以避免成型过程对膜表面的污染及减小对超导性能的影响。这两种方法已成功地应用于高Tc超导薄膜的红外探测器的制作。

This paper reports two kinds of patterning methods-chemical wetetching and lift-off process. Using chemical etching, it was found that the relation between the etching rate R and the concentration r in H3PO4 solution can be roughly described asR≌γ (γ≤50%).The etching rate was conveniently adjusted by choosing the solution concentration. The undercutting effect can be minimized when etched using the optimized condition. The lift-off process is not only suited to process narrow line, but also can avoid surface contamination of the film and greatly decrease the influence on superconducting properties in pattern process.The two kinds of patterning methods have been successfully used in fabrication of infrared detectors with high Tc superconducting thin films.