摘要
本文介绍一种硅基集成微晃动马达．该微马达的制作工艺非常简单，主要包括四次光刻（共三块版）、两次ＬＰＣＶＤ多晶硅膜淀积和两次ＬＴＯＳｉＯ２膜淀积．微马达转子和定子由厚度为４．２μｍ的多晶硅膜形成，转子与定子之间的空气间隙为２．０—２．５μｍ，转子的半径为４０—５０μｍ．初步测量结果表明，微晃动马达的最低驱动电压为４９Ｖ，最高转速估计可达６００ｒｐｍ。
Abstract We have successfully fabricated a silicon-based integrated wobble micromotor.The process for this motor is very simple,including four photolithography steps, two for polysilicon and two for silicon dioxide films by LPCVD. Both rotor and stator for this motor are formed from polysilicon films of 4.2μm thick.The rotor-stator air gaps are 2.0-2.5μm.the diameters of the rotors are 40-50μm.The initial test results show that the minimum driving voltage is 49 V and the maximum rotational speed is about 600 rpm.
