Co/Ni多层膜的热处理研究

Study on Co/Ni Multilayer Annealing

采用磁控溅射方法制备了Co/Ni多层膜并做了热处理,测量了系列样品的结构、磁性和磁电阻。受热处理条件等因素影响,多层膜的层间磁性耦合性质发生变化,电阻率下降,而其各向异性磁电阻的数值没有一致的变化趋势。讨论了磁性层织构和界面对多层膜的磁性与各向异性磁电阻效应的影响。

Co/Ni multilayers(MLs) were grown in DC sputtering chamber and annealed in the vacuum at 210℃ and 180℃. The annealing reduced the resistance of MLs and did not affect their isotropy magnetoresistace (AMR) obviously. The magnetism and X-ray-diffraction spectra of MLs both deposited and annealed were measured. The MLs residual magnetism vibrated with the Ni layer thickness. The vibrations result in Co and Ni layers coupling. The large AMR at room temperature and the low coercivity of these samples have promising appilcations in magne- toresistive devices.