摘要
通过磁过滤真空弧等离子体沉积技术 ,在单晶Si和H13钢衬底上生长一层Ti沉积膜。利用扫描电镜、X射线衍射仪和X射线光电子能谱仪对膜层进行了测量和分析。结果表明 ,加上磁过滤器的沉积膜表面平整光洁 ,无“液滴”出现。在靶室真空度不高的情况下 ,膜层中的Ti以TiO的形式存在 ,并且TiO晶粒沿 <110 >方向择优取向。膜层表面的TiO进一步与大气中氧发生反应形成TiO2 。
Titanium films were grown on substrates of single crystalline Si and H13 respectively by magnetically filtered vacuum arc deposition.The film was characterized with scanning electron spectroscopy,X ray diffraction and X ray photoelectron spectroscopy.The results show that the surface of the film is fairly flat with no ″droplets″ observed.The magnetic filter effectively prevents droplet formation.The film mainly consists of TiO because of the low bas pressure of the vacuum system.<110>is the preferential growing orientation of the TiO grains.After exposured in air,the surface of film reacts with oxygen and changes into TiO 2.
出处
《真空科学与技术》
CSCD
北大核心
2001年第2期158-161,共4页
Vacuum Science and Technology
基金
8 63高新技术项目
