摘要
应用胺基钛源可以降低CVD反应温度,并导出反应机理,指出淀积TiN的热力学可行性条件为P_(H2)=101325Pa,T=360±50℃.
Analysis of X-diffraction shows that the coating deposited in low temperature zone contains only Ti and N constituents and the ratio is 1:1. The coating in high temperature zone contaius Ti, N, C constitueuts. Addition of N to high temperature zone causes significant increase of the deposition, but the result is otherwise in low temperature zone
出处
《表面技术》
EI
CAS
CSCD
1989年第6期1-3,共3页
Surface Technology
