摘要
SU 8系列负性光刻胶是一种新品光刻胶 ,它具有良好的光敏性和高深宽比 ,适合于微机电系统 ,UV LIGA和其它厚膜、超厚膜应用[1,2 ] 。介绍了利用SU 85光刻胶 ,采用UV曝光制备LIGA掩模板所涉及的SU 85工艺研究结果。
SU-8 series photo resist is a new epoxy-negative-tone resist product.It has good light sensitivity and high aspect ratio.It is suited to application in MEMS system,UV-LIGA and other thick and ultra-thick films.The processing results related to fabricate LIGA mask using SU-8 5 resist and UV exposure system are reported.
出处
《微细加工技术》
2001年第2期57-60,共4页
Microfabrication Technology
