摘要
在不同本底真空和工作气压下制备了不同厚度的Ｎｉ８１Ｆｅ１９／Ｔａ薄膜，并进行了磁性测量 和原子力显微镜分析．结果表明，较厚的薄膜、较高的本底真空和较低的工作气压下制备的薄 膜有较大的各向异性磁电阻．其原因是高本底真空和低工作气压导致大晶粒度和低粗糙度，进 而降低电子的散射，减小电阻Ｒ，增大△Ｒ／Ｒ．而较厚薄膜中，大晶粒度的作用将抵消高粗糙度的 负作用，使△Ｒ／Ｒ值增大．
The Ni81Fe19/Ta films with different Nine thicknesses were.prepared at different base pressures and sputtering pressures. The results of magnetic measurement and atomic force microscope (AFM)showed that the thicker films and the films prepared at the higher base vacuum and the lower sputtering pressure had the larger △R/R. The reason is that the higher base vacuum and the lower sputtering pressure introduce the lar- ger grain-size and the lower surface roughness, which will weaken the scattering of the electrons, reduce the resistance R, and increase the △R/R.In the thicker films, the effect of the larger gum-she will offset that of the larger surface roughness, and the △R/R can be increased.
出处
《北京科技大学学报》
EI
CAS
CSCD
北大核心
2001年第3期243-245,共3页
Journal of University of Science and Technology Beijing
基金
国家自然科学基金资助项目(No.19890310)
