摘要
线宽控制是光刻质量的关键。以 0 8～ 1 0 μmIC电路生产为依据 ,讨论光刻机特性影响成像线宽的因素以及使用中的最佳调整。
In the optical lithography printing system, the image line width control is the key issues of the quality for photolithography. It will be discussed how the performance of the stepper does influence the image line width and how the stepper will be optimal adjusted during the operation. All discussion in the article is concemed only with the fabrication of 0.8～1.0μm IC.
出处
《电子工业专用设备》
2001年第1期27-33,共7页
Equipment for Electronic Products Manufacturing
关键词
步进光刻机
线宽控制
线宽误差
半导体
Photolithography Stepper,Line Width Control
Line Width Error
Factor
Adjustment
